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First reported by Grove in 1852 and Plucker in 1858, sputtering is a process whereby gas ions accelerated by a high voltage bombard a target and cause ejection of particles of atomic dimensions from the target material. The material is freed from the target then deposits on a nearby surface. If you are looking to move particles by way of sputtering, the RD Mathis Company offers you a wide selection of sputtering targets in a variety of diameters, purities and thicknesses.
You will see below some of our standard sizes of 2″, 3” and 4” elemental sputtering targets. All dimensions shown are ±.010”. Take a look at our selection below and let us know if you have any questions or need help with a custom quote.
We also offer hard-to-find materials & alloys to meet your specific needs. Other sizes of 5”, 6”, 8” and mm sizes, as well as custom sizes, are available on request.
